China's tech gateway has once again seen a major breakthrough. Recently, Harbin Institute of Technology (HIT) has successfully developed the technology of "electric energy conversion plasma circuit" to realize the application of DPP-EUV light source. This innovation is China's first breakthrough in the field of EUV lithography, which can not help but make people sit up and take notice of China's scientific and technological innovation ability.
EUV lithography is a device that uses extreme ultraviolet light (EUV) to make chips. This light has a very short wavelength of only 13.5 nanometers, which can carve finer lines on the chip, improving its performance and efficiency. At present, EUV lithography machines are essential equipment for manufacturing chips with processes below 7 nanometers.
The research team of HIT has carried out innovative research on the basis of DPP-EUV light source. Through the discovery of a new phenomenon and law of electric energy conversion plasma, and based on this, a new circuit structure is developed, which can efficiently convert electric energy into plasma energy, so as to drive the generation of EUV light source.
This achievement will bring revolutionary changes to China's chip manufacturing industry. Foreign media have expressed concern and highly praised this. The Wall Street Journal pointed out in the report that the technological breakthrough of HIT means that China's technical strength in the field of chip manufacturing has been improved again. The report also mentioned that the Chinese government's increasing investment in the field of science and technology in recent years has promoted the improvement of the country's scientific and technological innovation capacity.
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